For the beginning, this paper reconsiders the Nothing On Insulator transistor work principle. Then, some additional new studies are approached. Two directions are envisaged: (i) to change the source and drain composition or properties; (ii) to check if the vacuum from nanocavity can be replaced by oxide. The simulations proved excellent drain subthreshold slope of 45mV/dec for n- -V-p+ NOI variant. Oxide sub-2nm allows similar tunneling conduction as in nVn NOI variant. Comparisons with experimental picked points
from literature are available.
SOI-NOI | Nanodevices | Thin Film | Tunneling